发明授权
US08247617B2 Group 2 metal precursors for depositing multi-component metal oxide films 有权
用于沉积多组分金属氧化物膜的第2族金属前体

Group 2 metal precursors for depositing multi-component metal oxide films
摘要:
Novel Sr and Ba complexes containing both beta-diketonates and N-methyl-pyrrolidone were synthesized and characterized. TGA experiments indicated these complexes are volatile, they can be employed as precursors for ALD strontium titanate (STO) or barium strontium titanate films (BST) films in semiconductor fabrication.
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