Invention Grant
- Patent Title: Spatial filters
- Patent Title (中): 空间滤波器
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Application No.: US13154097Application Date: 2011-06-06
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Publication No.: US08249122B2Publication Date: 2012-08-21
- Inventor: Alex A. Behfar , Alfred T. Schremer
- Applicant: Alex A. Behfar , Alfred T. Schremer
- Applicant Address: US NY Ithaca
- Assignee: Binoptics Corporation
- Current Assignee: Binoptics Corporation
- Current Assignee Address: US NY Ithaca
- Agent William A. Blake
- Main IPC: H01S5/00
- IPC: H01S5/00
Abstract:
An etched-facet single lateral mode semiconductor photonic device is fabricated by depositing an anti reflective coating on the etched facet, and depositing a reflectivity modifying coating in a spatially controlled manner to modify the spatial performance of the emitted beam.
Public/Granted literature
- US20110317734A1 SPATIAL FILTERS Public/Granted day:2011-12-29
Information query
