发明授权
US08252119B2 Microelectronic substrate cleaning systems with polyelectrolyte and associated methods
失效
具有聚电解质和相关方法的微电子基板清洗系统
- 专利标题： Microelectronic substrate cleaning systems with polyelectrolyte and associated methods
- 专利标题（中）： 具有聚电解质和相关方法的微电子基板清洗系统
-
申请号： US12195003申请日： 2008-08-20
-
公开(公告)号： US08252119B2公开(公告)日： 2012-08-28
- 发明人: Joseph N. Greeley , Nishant Sinha , Lukasz Hupka , Timothy A. Quick , Prashant Raghu
- 申请人： Joseph N. Greeley , Nishant Sinha , Lukasz Hupka , Timothy A. Quick , Prashant Raghu
- 申请人地址： US ID Boise
- 专利权人： Micron Technology, Inc.
- 当前专利权人： Micron Technology, Inc.
- 当前专利权人地址： US ID Boise
- 代理机构： Perkins Coie LLP
- 主分类号： B08B3/08
- IPC分类号： B08B3/08
摘要：
Several embodiments of cleaning systems using polyelectrolyte and various associated methods for cleaning microelectronic substrates are disclosed herein. One embodiment is directed to a system that has a substrate support for holding the microelectronic substrate, a dispenser positioned above the substrate support and facing a surface of the microelectronic substrate, a reservoir in fluid communication with the dispenser via a conduit, and a washing solution contained in the reservoir. The washing solution includes a polyelectrolyte.
公开/授权文献
信息查询
IPC分类:
