发明授权
US08253924B2 Exposure method, exposure apparatus and device manufacturing method 有权
曝光方法,曝光装置和装置制造方法

Exposure method, exposure apparatus and device manufacturing method
摘要:
An exposure apparatus is provided with an optical system including a liquid, a sensor system for acquiring energy information of an energy beam which is incident on the liquid, and a controller which predicts variation of optical properties of the optical system including the liquid due to energy absorption of the liquid based on the energy information acquired using the sensor system and controls exposure operation with respect to an object based on the prediction results. According to the exposure apparatus, exposure operation without being influenced by the variation of the optical properties of the optical system including the liquid due to the energy absorption of the liquid becomes possible.
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