发明授权
US08253924B2 Exposure method, exposure apparatus and device manufacturing method
有权
曝光方法,曝光装置和装置制造方法
- 专利标题: Exposure method, exposure apparatus and device manufacturing method
- 专利标题(中): 曝光方法,曝光装置和装置制造方法
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申请号: US11919669申请日: 2006-05-23
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公开(公告)号: US08253924B2公开(公告)日: 2012-08-28
- 发明人: Yusaku Uehara , Kousuke Suzuki , Katsushi Nakano , Yasuhiro Omura
- 申请人: Yusaku Uehara , Kousuke Suzuki , Katsushi Nakano , Yasuhiro Omura
- 申请人地址: JP Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2005-151562 20050524
- 国际申请: PCT/JP2006/310218 WO 20060523
- 国际公布: WO2006/126522 WO 20061130
- 主分类号: G03B27/32
- IPC分类号: G03B27/32 ; G03B27/42 ; G03B27/54
摘要:
An exposure apparatus is provided with an optical system including a liquid, a sensor system for acquiring energy information of an energy beam which is incident on the liquid, and a controller which predicts variation of optical properties of the optical system including the liquid due to energy absorption of the liquid based on the energy information acquired using the sensor system and controls exposure operation with respect to an object based on the prediction results. According to the exposure apparatus, exposure operation without being influenced by the variation of the optical properties of the optical system including the liquid due to the energy absorption of the liquid becomes possible.
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