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    Method of preparing carrier for electrophotography, carrier for electrophotography, developer for electrophotography, process cartridge and image forming apparatus
    2.
    发明授权
    Method of preparing carrier for electrophotography, carrier for electrophotography, developer for electrophotography, process cartridge and image forming apparatus 有权
    制备电子照相用载体，电子照相用载体，电子照相用显影剂，处理盒和成像装置的方法

    公开(公告)号：US08647804B2

    公开(公告)日：2014-02-11

    申请号：US13483494

    申请日：2012-05-30

    Applicant: Yuuki Mizutani ,  Shinichiro Yagi ,  Kousuke Suzuki ,  Masato Taikoji

    Inventor： Yuuki Mizutani ,  Shinichiro Yagi ,  Kousuke Suzuki ,  Masato Taikoji

    IPC: G03G5/00 ,  G03G9/00

    CPC classification number: G03G9/1131 ,  G03G9/1132

    Abstract: A method of preparing carrier for electrophotography, which includes a core material and a coating material layer formed on the surface of the core material, including coating a coating material of the coating material layer on the core material; and burning the coating material by an induction heater, wherein the induction heater applies an alternative current to parallely-located plural coil circuits including a conductive wire including the shape of a coil to generate a magnetic line changing its direction and intensity for inductively heating the core material to heat the coating material.

    Abstract translation: 一种制备电子照相载体的方法，其包括在芯材表面上形成的芯材和涂层材料层，包括在芯材上涂覆涂层材料层的涂层材料; 并且通过感应加热器燃烧涂层材料，其中感应加热器向平行放置的多个线圈电路施加替代电流，所述多个线圈电路包括包括线圈形状的导线，以产生改变其方向和强度的磁线，用于感应加热芯 材料加热涂料。

    Exposure method, exposure apparatus and device manufacturing method
    3.
    发明授权
    Exposure method, exposure apparatus and device manufacturing method 有权
    曝光方法，曝光装置和装置制造方法

    公开(公告)号：US08253924B2

    公开(公告)日：2012-08-28

    申请号：US11919669

    申请日：2006-05-23

    Applicant: Yusaku Uehara ,  Kousuke Suzuki ,  Katsushi Nakano ,  Yasuhiro Omura

    Inventor： Yusaku Uehara ,  Kousuke Suzuki ,  Katsushi Nakano ,  Yasuhiro Omura

    IPC: G03B27/32 ,  G03B27/42 ,  G03B27/54

    CPC classification number: G03F7/70341 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/70558

    Abstract: An exposure apparatus is provided with an optical system including a liquid, a sensor system for acquiring energy information of an energy beam which is incident on the liquid, and a controller which predicts variation of optical properties of the optical system including the liquid due to energy absorption of the liquid based on the energy information acquired using the sensor system and controls exposure operation with respect to an object based on the prediction results. According to the exposure apparatus, exposure operation without being influenced by the variation of the optical properties of the optical system including the liquid due to the energy absorption of the liquid becomes possible.

    Abstract translation: 曝光装置设置有包括液体的光学系统，用于获取入射在液体上的能量束的能量信息的传感器系统，以及控制器，其预测由于能量而包括液体的光学系统的光学特性的变化 基于使用传感器系统获取的能量信息来吸收液体，并且基于预测结果控制相对于物体的曝光操作。 根据曝光装置，不会受到由液体的能量吸收引起的包括液体的光学系统的光学特性的变化的影响的曝光操作成为可能。

    Exposure apparatus, exposure method, and device manufacturing method
    5.
    发明申请
    Exposure apparatus, exposure method, and device manufacturing method 有权
    曝光装置，曝光方法和装置制造方法

    公开(公告)号：US20070291243A1

    公开(公告)日：2007-12-20

    申请号：US11785715

    申请日：2007-04-19

    Applicant: Kousuke Suzuki

    Inventor： Kousuke Suzuki

    IPC: G03B27/52

    CPC classification number: G03F7/70875 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70783

    Abstract: An exposure apparatus includes a projection optical system, which projects a pattern of a mask onto a prescribed exposure area on a substrate at a prescribed projection magnification. The optical axis center of the projection optical system is set to a position different from that of the center of the projection area onto which the pattern is projected. The exposure apparatus further includes a magnification modification device, which modifies the projection magnification of the projection optical system; a calculation device, which calculates a shift length of the center of the projection area associated with modification of the projection magnification; and a correction device, which corrects the position information of the exposure area based on the shift length of the center of the projection area.

    Abstract translation: 曝光装置包括投影光学系统，其以规定的投影倍率将掩模的图案投影到基板上的规定的曝光区域上。 将投影光学系统的光轴中心设定为与投影图案的投影区域的中心不同的位置。 所述曝光装置还具备能够改变所述投影光学系统的投影倍率的倍率变更装置， 计算装置，其计算与投影倍率的修改相关联的投影区域的中心的移动长度; 以及校正装置，其基于投影区域的中心的移动长度校正曝光区域的位置信息。

    Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
    6.
    发明授权
    Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium 有权
    图像形成状态调整系统，曝光方法和曝光装置以及程序和信息存储介质

    公开(公告)号：US07230682B2

    公开(公告)日：2007-06-12

    申请号：US10901209

    申请日：2004-07-29

    Applicant: Yasuo Shimizu ,  Shigeru Hirukawa ,  Kousuke Suzuki ,  Tomoyuki Matsuyama

    Inventor： Yasuo Shimizu ,  Shigeru Hirukawa ,  Kousuke Suzuki ,  Tomoyuki Matsuyama

    IPC: G03B27/32 ,  G03B27/68

    CPC classification number: G03B21/18 ,  G03B27/42 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/706

    Abstract: An exposure method of forming pattern on object via projection optical system, including deciding optimal adjustment amount of adjustment device which adjusts image forming property of the projection optical system to optimize the image forming property under pattern to be formed and exposure condition of the pattern, based on information related to wavefront aberration of the projection optical system, Zernike Sensitivity Chart corresponding to the pattern and the exposure condition, wavefront aberration variation table that denotes relation between adjustment amount of the adjustment device and change in coefficients of terms in the Zernike polynomial, and restraint condition with respect to the adjustment amount of the adjustment device, and exposing the pattern on the object under the exposure condition via the projection optical system of which the image forming property is adjusted by the adjustment device based on the decided optimal adjustment amount.

    Abstract translation: 一种通过投影光学系统在物体上形成图案的曝光方法，包括确定调整投影光学系统的图像形成特性的调整装置的最佳调节量，以优化待形成的图案下的图像形成特性和图案的曝光条件 关于与投影光学系统的波前像差相关的信息，对应于图案和曝光条件的Zernike感光度图，表示调节装置的调整量与Zernike多项式中的项的系数的变化之间的关系的波前像差变化表，以及 基于调整装置的调整量，通过调整装置调整图像形成特性的投影光学系统，根据所确定的最佳调整量，在曝光条件下将图案曝光在物体上。

    Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors
    8.
    发明授权
    Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors 失效
    热失真补偿投影曝光方法及半导体制造装置

    公开(公告)号：US5581324A

    公开(公告)日：1996-12-03

    申请号：US446511

    申请日：1995-05-22

    Applicant: Tsuneo Miyai ,  Yuji Imai ,  Tetsuo Taniguchi ,  Kousuke Suzuki

    Inventor： Tsuneo Miyai ,  Yuji Imai ,  Tetsuo Taniguchi ,  Kousuke Suzuki

    IPC: G03F7/20 ,  G03B27/42 ,  G03B27/52

    CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70866 ,  G03F7/70983

    Abstract: A projection exposure apparatus has a light source for emitting illumination light, an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with the illumination light, and a projection optical system for forming an image of the pattern on a photosensitive substrate, and images the image of the pattern on the photosensitive substrate in a predetermined imaging state. The apparatus also includes a temperature measurement sensor for measuring a change in temperature of the mask, a control system for calculating the change amount of the imaging state caused by the change in temperature, and a correction system for correcting the change in imaging state.

    Abstract translation: 投影曝光装置具有用于发射照明光的光源，用于照亮其上形成有预定图案的掩模的照明光学系统与照明光，以及用于在感光体上形成图案的图像的投影光学系统 衬底，并以预定的成像状态将图案的图像在感光衬底上成像。 该装置还包括用于测量掩模温度变化的温度测量传感器，用于计算由温度变化引起的成像状态的变化量的控制系统和用于校正成像状态变化的校正系统。

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