发明授权
- 专利标题： Substrate processing apparatus, program, storage medium and conditioning necessity determining method
- 专利标题（中）： 基板处理装置，程序，存储介质和调节必要性确定方法
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申请号： US12364356申请日： 2009-02-02
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公开(公告)号： US08255072B2公开(公告)日： 2012-08-28
- 发明人: Daisuke Morisawa
- 申请人： Daisuke Morisawa
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2006-207321 20060731
- 主分类号： G06F19/00
- IPC分类号： G06F19/00 ; B05C11/00
摘要：
A control unit of a substrate processing apparatus controls a process to be performed in a chamber. The process includes a step of performing a preceding first process; a step of performing a subsequent second process after performing the first process; a step of determining whether to perform an inter-process conditioning, for arranging the environment in the chamber, during a period between the end of the first process and the start of the second process, based on information on the first process and information on the second process; and a step of performing the inter-process conditioning prior to the second process when it is determined in the determining step that the inter-process conditioning is to be performed.