摘要:
The present invention provides a control valve which is capable of providing the quantification of the maximum flow rate on the occasion of opening the extraction valve and a predetermined small flow rate on the occasion of closing the extraction valve. This control valve comprises a main valve body provided with a discharge duct-communicating port, with a crank chamber-communicating port, with a crank chamber-communicating port, with an intake duct-communicating port, with a feed valve hole interposed between the discharge duct-communicating port and the crank chamber-communicating port, and with an extraction valve hole interposed between the inflow side crank chamber-communicating port and the intake duct-communicating port; a feed valve body which is capable of opening and closing the feed valve hole to a full or certain extent; an extraction valve body which is capable of opening and closing the extraction valve hole; and a solenoid magnetization portion which is capable of actuating the opening and closing of the feed valve body and of the extraction valve body. In a first status, a minimum flow rate is secured at the extraction valve body with the feed valve body being fully opened. In a second status, the feed valve body is fully closed and the extraction valve body is fully opened. In an intermediate status between the first status and the second status, the feed valve body is moved from a nearly closed state to a fully closed state depending on the value of control current. At the extraction valve body, a predetermined flow rate is effectuated irrespective of the opening degree thereof.
摘要:
A control valve for a compressor with a discharge port, a chamber port, a side chamber port, an intake port, a feed hole between the discharge port and the chamber port, an extraction hole between the side chamber port and the intake port; a feed valve controls the feed hole; an extraction valve controls the extraction hole; and a solenoid is capable of actuating the feed and extraction valves. In a first status, a minimum flow rate is secured at the extraction valve with the feed valve being fully opened. In a second status, the feed valve is fully closed and the extraction valve is fully opened. In an intermediate status, the feed valve is moved from a nearly closed state to a fully closed state depending on the value of control current. At the extraction valve, a predetermined flow rate is effectuated irrespective of its opening degree.
摘要:
A control device is provided that flexibly controls a substrate processing apparatus for each product process. Four process recipes PM 1 to PM 4 are stored in a first storage unit 255a. Corresponding to each of the process recipes, a high temperature, a medium temperature, and a low temperature pre-recipe are stored in a second storage unit 255b. A process recipe determination unit 260 determines, in response to a recipe specified by the operator, a process recipe corresponding to the specified recipe from the first storage unit 255a. A stage temperature acquisition unit 265 acquires, from the determined process recipe, a stage temperature. A pre-recipe selection unit 270 selects, from the three types of pre-recipes stored in the second storage unit 255b, one pre-recipe corresponding to the stage temperature. Before the wafer W is deposition-processed, therefore, the PM may be well-conditioned according to the selected pre-recipe.
摘要:
The control valve comprises a valve rod having a valve body part; a valve main body provided with a valve chamber having a valve port to/from which the valve body part contacts/separates, a discharge pressure refrigerant inlet for introducing the refrigerant from a compressor, and a refrigerant outlet communicating with a crank chamber of the compressor; an electromagnetic actuator having a plunger for moving the valve rod in the valve closing direction; a pressure sensing chamber in which suction pressure is introduced from the compressor; and a pressure sensitive response member for pressing the valve rod in the valve opening direction corresponding to the pressure in the pressure sensing chamber, wherein the valve rod is fitted to the plunger having a predetermined diametrical directional clearance so as not to be influenced from the lateral deviation and inclination of the plunger.
摘要:
A control device is provided that flexibly controls a substrate processing apparatus for each product process. Four process recipes PM 1 to PM 4 are stored in a first storage unit 255a. Corresponding to each of the process recipes, a high temperature, a medium temperature, and a low temperature pre-recipe are stored in a second storage unit 255b. A process recipe determination unit 260 determines, in response to a recipe specified by the operator, a process recipe corresponding to the specified recipe from the first storage unit 255a. A stage temperature acquisition unit 265 acquires, from the determined process recipe, a stage temperature. A pre-recipe selection unit 270 selects, from the three types of pre-recipes stored in the second storage unit 255b, one pre-recipe corresponding to the stage temperature. Before the wafer W is deposition-processed, therefore, the PM may be well-conditioned according to the selected pre-recipe.
摘要:
A substrate processing apparatus, which includes a plurality of process chambers for processing a substrate and a transfer part for carrying in and carrying out the substrate to and from the plurality of process chambers, includes a transfer history recording part, a process history recording part, and an alarm history recording part. The transfer history recording part relates history information concerning a transfer of the substrate by the transfer part to each substrate, and records the history information as first history information. The process history recording part relates history information concerning a process state of the substrate in each of the plurality of process chambers to each substrate subject to be processed, and records the history information as second history information. The alarm history recording part relates history information concerning an alarm occurred in at least one of the transfer part and the process chambers to each substrate, and records the history information as third history information.
摘要:
A substrate processing apparatus, which includes a plurality of process chambers for processing a substrate and a transfer part for carrying in and carrying out the substrate to and from the plurality of process chambers, includes a transfer history recording part, a process history recording part, and an alarm history recording part. The transfer history recording part relates history information concerning a transfer of the substrate by the transfer part to each substrate, and records the history information as first history information. The process history recording part relates history information concerning a process state of the substrate in each of the plurality of process chambers to each substrate subject to be processed, and records the history information as second history information. The alarm history recording part relates history information concerning an alarm occurred in at least one of the transfer part and the process chambers to each substrate, and records the history information as third history information.
摘要:
A control unit of a substrate processing apparatus controls a process to be performed in a chamber. The process includes a step of performing a preceding first process; a step of performing a subsequent second process after performing the first process; a step of determining whether to perform an inter-process conditioning, for arranging the environment in the chamber, during a period between the end of the first process and the start of the second process, based on information on the first process and information on the second process; and a step of performing the inter-process conditioning prior to the second process when it is determined in the determining step that the inter-process conditioning is to be performed.
摘要:
A control unit of a substrate processing apparatus controls a process to be performed in a chamber. The process includes a step of performing a preceding first process; a step of performing a subsequent second process after performing the first process; a step of determining whether to perform an inter-process conditioning, for arranging the environment in the chamber, during a period between the end of the first process and the start of the second process, based on information on the first process and information on the second process; and a step of performing the inter-process conditioning prior to the second process when it is determined in the determining step that the inter-process conditioning is to be performed.
摘要:
A control valve for a variable capacity compressor, which makes it possible to increase the full open flow rate so as to make it applicable to even a compressor of large capacity without inviting any substantial increase in size and weight, and to minimize the quantity of leakage of cooling medium from the valve chamber into the suction pressure cooling medium-introducing chamber to thereby make it possible to enhance the accuracy of control and to suppress the occurrence of operational failure including the clogging due to foreign substances, the locking of valve rod, etc. The valve rod is provided, at a lower portion thereof, with a lower valve body portion (16A) and an upper valve body portion (16B), and the valve chamber is provided with a lower valve seat (22a) and an upper valve seat (22b) in such a manner that the lower valve body portion (16A) and the upper valve body portion (16B) are concurrently enabled to detachably contact with their respective valve seats, and a lower cooling medium outlet chamber (26A) and an upper cooling medium outlet chamber (26B) are disposed on the downstream sides of the lower valve seat (22a) and of the upper valve seat (22b), respectively.