发明授权
- 专利标题: Method and apparatus for detecting plasma unconfinement
- 专利标题(中): 用于检测等离子体无约束的方法和装置
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申请号: US12114681申请日: 2008-05-02
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公开(公告)号: US08257503B2公开(公告)日: 2012-09-04
- 发明人: KeeChan Kim , Yunsang Kim , Andrew D. Bailey, III
- 申请人: KeeChan Kim , Yunsang Kim , Andrew D. Bailey, III
- 申请人地址: US CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: US CA Fremont
- 代理机构: Martine Penilla Group LLP
- 主分类号: C25F3/30
- IPC分类号: C25F3/30
摘要:
A method for detecting plasma unconfinement in a reaction chamber during a bevel edge cleaning operation is provided. The method initiates with selecting a wavelength associated with expected by products of a bevel edge clean process. The method includes cleaning the bevel edge area of a substrate and monitoring the intensity of the selected wavelengths during the cleaning for deviation from a threshold wavelength intensity. The cleaning is terminated if the deviation from the threshold wavelength intensity exceeds a target deviation.
公开/授权文献
- US20090272402A1 METHOD AND APPARATUS FOR DETECTING PLASMA UNCONFINEMENT 公开/授权日:2009-11-05
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