发明授权
- 专利标题: Ultrathin spacer formation for carbon-based FET
- 专利标题(中): 碳基FET的超薄间隔物形成
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申请号: US13401967申请日: 2012-02-22
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公开(公告)号: US08274072B2公开(公告)日: 2012-09-25
- 发明人: Zhihong Chen , Dechao Guo , Shu-jen Han , Kai Zhao
- 申请人: Zhihong Chen , Dechao Guo , Shu-jen Han , Kai Zhao
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Cantor Colburn LLP
- 代理商 Vazken Alexanian
- 主分类号: H01L29/76
- IPC分类号: H01L29/76
摘要:
A carbon-based field effect transistor (FET) includes a substrate; a carbon layer located on the substrate, the carbon layer comprising a channel region, and source and drain regions located on either side of the channel region; a gate electrode located on the channel region in the carbon layer, the gate electrode comprising a first dielectric layer, a gate metal layer located on the first dielectric layer, and a nitride layer located on the gate metal layer; and a spacer comprising a second dielectric layer located adjacent to the gate electrode, wherein the spacer is not located on the carbon layer.
公开/授权文献
- US20120146001A1 ULTRATHIN SPACER FORMATION FOR CARBON-BASED FET 公开/授权日:2012-06-14
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