Invention Grant
- Patent Title: Ultrathin spacer formation for carbon-based FET
- Patent Title (中): 碳基FET的超薄间隔物形成
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Application No.: US13401967Application Date: 2012-02-22
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Publication No.: US08274072B2Publication Date: 2012-09-25
- Inventor: Zhihong Chen , Dechao Guo , Shu-jen Han , Kai Zhao
- Applicant: Zhihong Chen , Dechao Guo , Shu-jen Han , Kai Zhao
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
A carbon-based field effect transistor (FET) includes a substrate; a carbon layer located on the substrate, the carbon layer comprising a channel region, and source and drain regions located on either side of the channel region; a gate electrode located on the channel region in the carbon layer, the gate electrode comprising a first dielectric layer, a gate metal layer located on the first dielectric layer, and a nitride layer located on the gate metal layer; and a spacer comprising a second dielectric layer located adjacent to the gate electrode, wherein the spacer is not located on the carbon layer.
Public/Granted literature
- US20120146001A1 ULTRATHIN SPACER FORMATION FOR CARBON-BASED FET Public/Granted day:2012-06-14
Information query
IPC分类: