发明授权
US08274638B2 Reflective, refractive and projecting optical system; reflective, refractive and projecting device; scanning exposure device; and method of manufacturing micro device
有权
反光，折射和投影光学系统; 反射，折射和投影设备; 扫描曝光装置; 微型器件的制造方法
- 专利标题： Reflective, refractive and projecting optical system; reflective, refractive and projecting device; scanning exposure device; and method of manufacturing micro device
- 专利标题（中）： 反光，折射和投影光学系统; 反射，折射和投影设备; 扫描曝光装置; 微型器件的制造方法
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申请号： US12201972申请日： 2008-08-29
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公开(公告)号： US08274638B2公开(公告)日： 2012-09-25
- 发明人: Masaki Kato
- 申请人： Masaki Kato
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 优先权： JP2006-076011 20060320; JP2007-006655 20070116
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
A scanning exposure apparatus of the present invention is one for transferring a pattern of a first object onto a second object while projecting an image of the first object placed on a first plane, onto the second object placed on a second plane and changing a positional relation between the image of the first object and the second object in a scanning direction. The scanning exposure apparatus has a first projection optical system having a first field of view on the first plane and adapted to project an enlargement image of a portion of the first object in a first projection region on the second plane, based on light from the first field of view, and a second projection optical system having a second field of view on the first plane and adapted to project an enlargement image of a portion of the first object in a second projection region on the second plane, based on light from the second field of view. The scanning exposure apparatus satisfies the relation of Dp=β×Dm, where Dm is a first interval being an interval along the scanning direction on the first plane between the first field of view and the second field of view, Dp is a second interval being an interval along the scanning direction on the second plane between the first projection region and the second projection region, and β is a magnification of the first and second projection optical systems.
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