发明授权
- 专利标题: Antenna for plasma processor and apparatus
- 专利标题(中): 等离子体处理器和设备天线
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申请号: US13020170申请日: 2011-02-03
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公开(公告)号: US08277604B2公开(公告)日: 2012-10-02
- 发明人: Arthur M. Howald , Andras Kuthi
- 申请人: Arthur M. Howald , Andras Kuthi
- 申请人地址: US CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: US CA Fremont
- 代理机构: Lowe Hauptman Ham & Berner, LLP
- 主分类号: C23C16/00
- IPC分类号: C23C16/00 ; H01L21/306
摘要:
An antenna includes excitation terminals responsive to an RF source to supply an RF electromagnetic field to a plasma that processes a workpiece in a vacuum chamber. The coil includes a transformer having a primary winding coupled to the excitation terminals and a multi-turn plasma excitation secondary winding connected in series with a capacitor.
公开/授权文献
- US20110120653A1 ANTENNA FOR PLASMA PROCESSOR AND APPARATUS 公开/授权日:2011-05-26
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