发明授权
US08278951B2 Probe station for testing semiconductor substrates and comprising EMI shielding
有权
用于测试半导体衬底并包含EMI屏蔽的探头站
- 专利标题： Probe station for testing semiconductor substrates and comprising EMI shielding
- 专利标题（中）： 用于测试半导体衬底并包含EMI屏蔽的探头站
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申请号： US11940355申请日： 2007-11-15
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公开(公告)号： US08278951B2公开(公告)日： 2012-10-02
- 发明人: Stojan Kanev , Hans-Jurgen Fleischer , Stefan Kreissig , Karsten Stoll , Axel Schmidt , Andreas Kittlaus
- 申请人： Stojan Kanev , Hans-Jurgen Fleischer , Stefan Kreissig , Karsten Stoll , Axel Schmidt , Andreas Kittlaus
- 申请人地址： US OR Beaverton
- 专利权人： Cascade Microtech, Inc.
- 当前专利权人： Cascade Microtech, Inc.
- 当前专利权人地址： US OR Beaverton
- 代理机构： DASCENZO Intellectual Property Law, P.C.
- 优先权： DE102006054672 20061117
- 主分类号： G01R31/00
- IPC分类号： G01R31/00
摘要：
A probe station for testing semiconductor substrates, i.e., wafers and other electronic semiconductor elements, suitable for carrying out low-current and low-voltage measurement, comprises a shielding with which the electromagnetic influence (EMI) of the measurement of the semiconductor substrate can be minimized, and also comprises devices for the preparation of test signals. In addition, the housing of the probe station can offer a different possibility for the accessibility of individual components or component groups of the probe station.