发明授权
US08304264B2 Apparatus and method for monitoring chamber status in semiconductor fabrication process
有权
用于监测半导体制造工艺中的室状态的装置和方法
- 专利标题: Apparatus and method for monitoring chamber status in semiconductor fabrication process
- 专利标题(中): 用于监测半导体制造工艺中的室状态的装置和方法
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申请号: US12858691申请日: 2010-08-18
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公开(公告)号: US08304264B2公开(公告)日: 2012-11-06
- 发明人: Sang-Wuk Park , Woo-Seok Kim , Yong-Jin Kim
- 申请人: Sang-Wuk Park , Woo-Seok Kim , Yong-Jin Kim
- 申请人地址: KR Suwon-si, Gyeonggi-do
- 专利权人: Samsung Electronics, Co., Ltd.
- 当前专利权人: Samsung Electronics, Co., Ltd.
- 当前专利权人地址: KR Suwon-si, Gyeonggi-do
- 代理机构: Lee & Morse, P.C.
- 优先权: KR10-2009-0086452 20090914
- 主分类号: G01R31/26
- IPC分类号: G01R31/26
摘要:
A chamber-status monitoring apparatus includes a plurality of chambers, a time-division multiplexer configured to receive, via optical fiber probes, optical signals from each chamber, to divide each optical signal into first time slots having a predetermined duration, and to multiplex the first time slots to generate an OTDM signal, a multi-input optical emission spectroscope configured to receive and disperse the OTDM signal according to wavelengths to measure spectrum information, and a controller configured to divide the spectrum information of the dispersed OTDM signal into second time slots with a predetermined time interval therebetween, to classify the second time slots according to the chambers to obtain spectrum information of the optical signals of the individual chambers, and to control endpoint detection in each of the chambers in accordance with the spectrum information of the optical signal of the corresponding chamber.
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