发明授权
- 专利标题: Method for measuring the thickness or curvature of thin films
- 专利标题(中): 测量薄膜厚度或曲率的方法
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申请号: US12594082申请日: 2008-03-28
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公开(公告)号: US08310686B2公开(公告)日: 2012-11-13
- 发明人: Stephen Morris
- 申请人: Stephen Morris
- 申请人地址: GB Wrexham, Clwyd
- 专利权人: Nightingale-EOS Ltd
- 当前专利权人: Nightingale-EOS Ltd
- 当前专利权人地址: GB Wrexham, Clwyd
- 代理机构: Bingham McCutchen LLP
- 优先权: GB0706288.8 20070330
- 国际申请: PCT/GB2008/001136 WO 20080328
- 国际公布: WO2008/119984 WO 20081009
- 主分类号: G01B11/28
- IPC分类号: G01B11/28
摘要:
A method and means for determining the thickness, or curvature, of a thin film or stack of thin films disposed on the surface of a substrate having a curvature comprising generating a beam of radiation, focusing the beam through the one or more films onto a surface of the substrate, measuring the intensity across the reflected beam as a function of the angle of incidence of a plurality of rays derived from the focussed beam, determining the path of each of the plurality of rays and determining the thickness, or curvature of the film, or films, from the angular dependent intensity measurement.
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