Dielectric layer for semiconductor device and method of manufacturing the same

Invention Grant

US08314465B2 Dielectric layer for semiconductor device and method of manufacturing the same 有权

Title translation: 用于半导体器件的介电层及其制造方法

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Patent Title: Dielectric layer for semiconductor device and method of manufacturing the same
Patent Title (中): 用于半导体器件的介电层及其制造方法
Application No.: US13039811

Application Date: 2011-03-03
Publication No.: US08314465B2

Publication Date: 2012-11-20
Inventor: Jong-Ho Lee , Nae-In Lee
Applicant: Jong-Ho Lee , Nae-In Lee
Applicant Address: KR Suwon-Si, Gyeonggi-Do
Assignee: Samsung Electronics Co., Inc.
Current Assignee: Samsung Electronics Co., Inc.
Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
Agency: F. Chau & Associates, LLC
Priority: KR2004-5817 20040129
Main IPC: H01L29/76
IPC: H01L29/76

Dielectric layer for semiconductor device and method of manufacturing the same

Abstract:

A semiconductor device comprises a silicate interface layer and a high-k dielectric layer overlying the silicate interface layer. The high-k dielectric layer comprises metal alloy oxides.

Abstract(Chinese):

半导体器件包括硅酸盐界面层和覆盖硅酸盐界面层的高k电介质层。高k电介质层包括金属合金氧化物。

Public/Granted literature

US20110198710A1 DIELECTRIC LAYER FOR SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2011-08-18

Information query

Espacenet

IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L29/00	专门适用于整流、放大、振荡或切换，并具有至少一个电位跃变势垒或表面势垒的半导体器件；具有至少一个电位跃变势垒或表面势垒，例如PN结耗尽层或载流子集结层的电容器或电阻器；半导体本体或其电极的零部件（H01L31/00至H01L47/00，H01L51/05优先；除半导体或其电极之外的零部件入H01L23/00；由在一个共用衬底内或其上形成的多个固态组件组成的器件入H01L27/00）
H01L29/66	.按半导体器件的类型区分的
H01L29/68	..只能通过对一个不通有待整流、放大或切换的电流的电极供给电流或施加电位方可进行控制的（H01L29/96优先）
H01L29/76	...单极器件