发明授权
- 专利标题: Semiconductor device and method of manufacturing the same
- 专利标题(中): 半导体装置及其制造方法
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申请号: US12691175申请日: 2010-01-21
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公开(公告)号: US08314484B2公开(公告)日: 2012-11-20
- 发明人: Ryoichi Kajiwara , Shigehisa Motowaki , Kazutoshi Ito , Toshiaki Ishii , Katsuo Arai , Takuya Nakajo , Hidemasa Kagii
- 申请人: Ryoichi Kajiwara , Shigehisa Motowaki , Kazutoshi Ito , Toshiaki Ishii , Katsuo Arai , Takuya Nakajo , Hidemasa Kagii
- 申请人地址: JP Kanagawa
- 专利权人: Renesas Electronics Corporation
- 当前专利权人: Renesas Electronics Corporation
- 当前专利权人地址: JP Kanagawa
- 代理机构: Brundidge & Stanger, P.C.
- 优先权: JP2009-013386 20090123
- 主分类号: H01L23/15
- IPC分类号: H01L23/15
摘要:
In a structure of a semiconductor device, a Si chip and a metal leadframe are jointed by metallic bond via a porous joint layer made of high conductive metal, having a three-dimensional network structure and using Ag as a bonding material, and a film containing Zn oxide or Al oxide is formed on a surface of a semiconductor assembly contacting to a polymer resin. In this manner, by the joint with the joint layer having the porous structure mainly made of Ag, thermal stress load of the Si chip can be reduced, and fatigue life of the joint layer itself can be improved. Besides, since adhesion of the polymer resin to the film can be enhanced by the anchor effect, occurrence of cracks in a bonding portion can be prevented, so that a highly-reliable Pb-free semiconductor device can be provided.
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