发明授权
US08317932B2 Reduction of entrance and exit marks left by a substrate-processing meniscus
有权
减少由基板处理半月板留下的入口和出口痕迹
- 专利标题: Reduction of entrance and exit marks left by a substrate-processing meniscus
- 专利标题(中): 减少由基板处理半月板留下的入口和出口痕迹
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申请号: US12725422申请日: 2010-03-16
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公开(公告)号: US08317932B2公开(公告)日: 2012-11-27
- 发明人: Robert O'Donnell , John de Larios , Mike Ravkin
- 申请人: Robert O'Donnell , John de Larios , Mike Ravkin
- 申请人地址: US CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: US CA Fremont
- 代理机构: Martine Penilla Group, LLP
- 主分类号: B08B5/04
- IPC分类号: B08B5/04
摘要:
A substrate is placed on a plurality of support pins within an opening of a carrier, such that a gap exists between the radial perimeter of the substrate and the carrier. The substrate and carrier are passed in a linear direction through a meniscus generated between respective faces of upper and lower proximity heads. Each of the upper and lower proximity heads includes a plurality of meniscus nozzles configured to supply liquid to the meniscus. A plurality of vacuum ports are formed on the respective face of each of the upper and lower proximity heads and are arranged to completely surround the plurality of meniscus nozzles. Liquid of the meniscus is evacuated from the gap between the radial perimeter of the substrate and the carrier so as to reduce a size and a frequency of at least one of entrance or exit marks on the substrate.
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