发明授权
US08317970B2 Ceiling electrode with process gas dispersers housing plural inductive RF power applicators extending into the plasma
有权
具有处理气体分散器的天花板电极，其容纳延伸到等离子体中的多个感应RF功率施加器
- 专利标题： Ceiling electrode with process gas dispersers housing plural inductive RF power applicators extending into the plasma
- 专利标题（中）： 具有处理气体分散器的天花板电极，其容纳延伸到等离子体中的多个感应RF功率施加器
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申请号： US12132133申请日： 2008-06-03
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公开(公告)号： US08317970B2公开(公告)日： 2012-11-27
- 发明人: Canfeng Lai , Lily L. Pang , Majeed A. Foad
- 申请人： Canfeng Lai , Lily L. Pang , Majeed A. Foad
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理商 Robert M. Wallace
- 主分类号： C23C16/00
- IPC分类号： C23C16/00 ; H01L21/306
摘要：
A gas distribution plate is formed of a metallic body having a bottom surface with plural gas disperser orifices and an internal gas manifold feeding the orifices. Each one of an array of discrete RF power applicators held in the plate includes (a) an insulating cylindrical housing extending through the plate, a portion of the housing extending outside of the plate through the bottom surface, and (b) a conductive solenoidal coil contained within the housing, a portion of the coil lying within the portion of the housing that extends outside of the plate through the bottom surface.
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