发明授权
US08323769B2 Methods of treating a surface to promote metal plating and devices formed
有权
处理表面以促进金属电镀和形成的器件的方法
- 专利标题: Methods of treating a surface to promote metal plating and devices formed
- 专利标题(中): 处理表面以促进金属电镀和形成的器件的方法
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申请号: US12628978申请日: 2009-12-01
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公开(公告)号: US08323769B2公开(公告)日: 2012-12-04
- 发明人: Werner G. Kuhr , Steven Z. Shi , Jen-Chieh Wei , Zhiming Liu , Lingyun Wei
- 申请人: Werner G. Kuhr , Steven Z. Shi , Jen-Chieh Wei , Zhiming Liu , Lingyun Wei
- 申请人地址: DE Berlin
- 专利权人: Atotech Deutschland GmbH
- 当前专利权人: Atotech Deutschland GmbH
- 当前专利权人地址: DE Berlin
- 代理机构: Nixon Peabody LLP
- 主分类号: B32B3/10
- IPC分类号: B32B3/10 ; B32B15/04 ; B32B15/08
摘要:
Embodiments of the present invention provide methods of treating a surface of a substrate. In one particular aspect, embodiments of the present invention provide methods of treating a surface of a substrate that promote binding of one or more metal elements to the surface. According to some embodiments of the invention, films are formed on any conducting, semiconductive or non-conductive surface, by thermal reaction of molecules containing reactive groups in an organic solvent or in aqueous solution. The thermal reaction may be produced under a variety of conditions. In another aspect, the present invention provides a printed circuit board, comprising: at least one substrate; a layer of organic molecules attached to the at least one substrate; and a metal layer atop said layer of organic molecules.
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