发明授权
- 专利标题: Method of fabricating a nanostructure on a pre-etched substrate
- 专利标题(中): 在预蚀刻的衬底上制造纳米结构的方法
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申请号: US12375272申请日: 2007-06-26
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公开(公告)号: US08329049B2公开(公告)日: 2012-12-11
- 发明人: Ursula Ebels , Bernard Dieny , Dominique Lestelle , Eric Gautier
- 申请人: Ursula Ebels , Bernard Dieny , Dominique Lestelle , Eric Gautier
- 申请人地址: FR Paris
- 专利权人: Commissariat a l'Energie Atomique
- 当前专利权人: Commissariat a l'Energie Atomique
- 当前专利权人地址: FR Paris
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: FR0606907 20060727
- 国际申请: PCT/IB2007/002912 WO 20070626
- 国际公布: WO2008/012684 WO 20080131
- 主分类号: B23P15/00
- IPC分类号: B23P15/00 ; C03C25/00 ; C23F1/00 ; B05D3/00
摘要:
The present invention relates to a method of fabricating a nanostructure, comprising the following steps: prestructuring a substrate (1) adapted to receive the nanostructure to form a nanorelief (2) on the substrate, the nanorelief having flanks (4) extending from a bottom (1a) of the substrate and a top face (3) extending from said flanks, and then depositing on the substrate pre-structured in this way a single layer or multilayer coating intended to form the nanostructure; and further comprising: adding to the prestructured substrate or to the coating a separation layer adapted to enable separation of the coating and the substrate by external action of mechanical, thermomechanical or vibratory type; and exerting this external action on the substrate and/or the coating to recover selectively a top portion of the coating by separating it from the top face of the nanorelief so that this top portion constitutes some or all of the nanostructure.
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