发明授权
US08329386B2 Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby
有权
在衬底上组装纳米结构的方法和由此形成的纳米结构的纳米分子器件
- 专利标题： Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby
- 专利标题（中）： 在衬底上组装纳米结构的方法和由此形成的纳米结构的纳米分子器件
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申请号： US12704899申请日： 2010-02-12
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公开(公告)号： US08329386B2公开(公告)日： 2012-12-11
- 发明人: Byung You Hong , Hyung Jin Kim , Yong Han Roh
- 申请人： Byung You Hong , Hyung Jin Kim , Yong Han Roh
- 申请人地址： KR Gyeonggi-Do
- 专利权人： Sungkyunkwan University Foundation for Corporate Collaboration
- 当前专利权人： Sungkyunkwan University Foundation for Corporate Collaboration
- 当前专利权人地址： KR Gyeonggi-Do
- 代理机构： Renner, Otto, Boisselle & Sklar, LLP
- 优先权： KR10-2009-0013339 20090218
- 主分类号： G03F7/26
- IPC分类号： G03F7/26
摘要：
A method of selectively positioning nanostructures on a substrate is provided which includes: a first step of forming a photoresist pattern on the substrate and then control the line width of the photoresist pattern in a nano unit to form a nanometer photoresist layer; a second step of forming a protective layer for preventing adsorption of a nano-material in a patter-unformed area on the substrate on which the nanometer photoresist layer has been formed; a third step of removing the photoresist layer formed on the substrate; a fourth step of forming a positively-charged or negatively charged adsorbent layer in the area from which the photoresist layer has been removed; and a fifth step of applying a nano-material-containing solution charged in the opposite polarity of the adsorbent layer to the substrate on which the adsorbent layer has been formed.
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