发明授权
- 专利标题: Method of manufacturing semiconductor device
- 专利标题(中): 制造半导体器件的方法
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申请号: US13081160申请日: 2011-04-06
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公开(公告)号: US08338288B2公开(公告)日: 2012-12-25
- 发明人: Tamaki Wada , Akihiro Tobita , Seiichi Ichihara
- 申请人: Tamaki Wada , Akihiro Tobita , Seiichi Ichihara
- 申请人地址: JP Kanagawa
- 专利权人: Renesas Electronics Corporation
- 当前专利权人: Renesas Electronics Corporation
- 当前专利权人地址: JP Kanagawa
- 代理机构: Womble Carlyle
- 优先权: JP2010-090152 20100409
- 主分类号: H01L21/44
- IPC分类号: H01L21/44
摘要:
In connection with a semiconductor device in which a conductive member is coupled to the surface of a bonding pad exposed from an opening formed in a passivation film, there is provided a technique able to suppress the occurrence of a crack in the passivation film. A second planar distance between a first end of an electrode layer and a first end of a pad is greater than a first planar distance between the first end of the electrode layer and a first end of an opening. Since the second planar distance between the first end of the electrode layer and the first end of the pad is long, even when a coupled position of wire is deviated to the first end side of the electrode layer, stress caused by coupling of the wire to a stepped portion of the electrode layer can be prevented from being transmitted to the first end portion of the pad.
公开/授权文献
- US20110248406A1 Method of Manufacturing Semiconductor Device 公开/授权日:2011-10-13
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