发明授权
US08347901B2 Substrate cleaning method, substrate cleaning system and program storage medium
有权
基板清洗方法，基板清洗系统和程序存储介质
- 专利标题： Substrate cleaning method, substrate cleaning system and program storage medium
- 专利标题（中）： 基板清洗方法，基板清洗系统和程序存储介质
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申请号： US11717170申请日： 2007-03-13
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公开(公告)号： US08347901B2公开(公告)日： 2013-01-08
- 发明人: Tsukasa Watanabe , Naoki Shindo , Takahiro Furukawa , Yuji Kamikawa
- 申请人： Tsukasa Watanabe , Naoki Shindo , Takahiro Furukawa , Yuji Kamikawa
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Smith, Gambrell & Russell, LLP
- 优先权： JP2006-070538 20060315
- 主分类号： B08B3/12
- IPC分类号： B08B3/12
摘要：
The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in a cleaning tank 12. Then, ultrasonic waves are generated in the cleaning liquid contained in the cleaning tank 12, so that the substrate to be processed W is subjected to an ultrasonic cleaning process. While the substrate to be processed is being cleaned, a dissolved gas concentration of a gas dissolved in the cleaning liquid contained in the cleaning tank is changed.
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