Invention Grant
- Patent Title: Method and system for providing a magnetoresistive structure using undercut free mask
- Patent Title (中): 使用无切削掩模提供磁阻结构的方法和系统
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Application No.: US12163865Application Date: 2008-06-27
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Publication No.: US08349195B1Publication Date: 2013-01-08
- Inventor: Weimin Si , Liubo Hong , Honglin Zhu , Winnie Yu , Rowena Schmidt
- Applicant: Weimin Si , Liubo Hong , Honglin Zhu , Winnie Yu , Rowena Schmidt
- Applicant Address: US CA Fremont
- Assignee: Western Digital (Fremont), LLC
- Current Assignee: Western Digital (Fremont), LLC
- Current Assignee Address: US CA Fremont
- Main IPC: B44C1/22
- IPC: B44C1/22 ; G11B5/127

Abstract:
A method and system provide a magnetoresistive structure from a magnetoresistive stack that includes a plurality of layers. The method and system include providing a mask that exposes a portion of the magnetoresistive stack. The mask has at least one side, a top, and a base at least as wide as the top. The method and system also include removing the portion of the magnetoresistive stack to define the magnetoresistive structure. The method and system further include providing an insulating layer. A portion of the insulating layer resides on the at least one side of the mask. The method and system further include removing the portion of the insulating layer on the at least one side of the mask and removing the mask.
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