发明授权
- 专利标题: Photovoltaic device and manufacturing method thereof
- 专利标题(中): 光伏器件及其制造方法
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申请号: US12987245申请日: 2011-01-10
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公开(公告)号: US08349643B2公开(公告)日: 2013-01-08
- 发明人: Akira Terakawa
- 申请人: Akira Terakawa
- 申请人地址: JP Moriguchi
- 专利权人: Sanyo Electric Co., Ltd.
- 当前专利权人: Sanyo Electric Co., Ltd.
- 当前专利权人地址: JP Moriguchi
- 代理机构: Mots Law, PLLC
- 代理商 Marvin A. Motsenbocker
- 优先权: JP2007-070014 20070319
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L31/00
摘要:
A photovoltaic device capable of improving an output characteristic is provided. The photovoltaic device includes an n-type single-crystal silicon substrate, a p-type amorphous silicon substrate, and a substantially intrinsic i-type amorphous silicon layer disposed between the n-type single-crystal silicon substrate and the p-type amorphous silicon layer. The i-type amorphous silicon layer includes: a first section which is located on the n-type single-crystal silicon substrate side, and which has an oxygen concentration equal to or below 1020 cm−3; and a second section which is located on the p-type amorphous silicon layer side, and which has an oxygen concentration equal to or above 1020 cm−3.
公开/授权文献
- US20110104849A1 PHOTOVOLTAIC DEVICE AND MANUFACTURING METHOD THEREOF 公开/授权日:2011-05-05
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