发明授权
US08349648B2 Semiconductor device and method of forming RF FEM with IC filter and IPD filter over substrate
有权
半导体器件和使用LC滤波器和IPD滤波器在衬底上形成RF FEM的方法
- 专利标题: Semiconductor device and method of forming RF FEM with IC filter and IPD filter over substrate
- 专利标题(中): 半导体器件和使用LC滤波器和IPD滤波器在衬底上形成RF FEM的方法
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申请号: US12816225申请日: 2010-06-15
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公开(公告)号: US08349648B2公开(公告)日: 2013-01-08
- 发明人: HyunTai Kim , YongTaek Lee , Gwang Kim , ByungHoon Ahn , Kai Liu
- 申请人: HyunTai Kim , YongTaek Lee , Gwang Kim , ByungHoon Ahn , Kai Liu
- 申请人地址: SG Singapore
- 专利权人: STATS ChipPAC, Ltd.
- 当前专利权人: STATS ChipPAC, Ltd.
- 当前专利权人地址: SG Singapore
- 代理机构: Patent Law Group: Atkins and Associates, P.C.
- 代理商 Robert D. Atkins
- 主分类号: H01L21/98
- IPC分类号: H01L21/98
摘要:
A semiconductor device has a substrate and RF FEM formed over the substrate. The RF FEM includes an LC low-pass filter having an input coupled for receiving a transmit signal. A Tx/Rx switch has a first terminal coupled to an output of the LC filter. A diplexer has a first terminal coupled to a second terminal of the Tx/Rx switch and a second terminal for providing an RF signal. An IPD band-pass filter has an input coupled to a third terminal of the Tx/Rx switch and an output providing a receive signal. The LC filter includes conductive traces wound to exhibit inductive and mutual inductive properties and capacitors coupled to the conductive traces. The IPD filter includes conductive traces wound to exhibit inductive and mutual inductive properties and capacitors coupled to the conductive traces. The RF FEM substrate can be stacked over a semiconductor package containing an RF transceiver.
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