Invention Grant
- Patent Title: Fluid handling structure, lithographic apparatus and device manufacturing method
- Patent Title (中): 流体处理结构，光刻设备和器件制造方法
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Application No.: US12436626Application Date: 2009-05-06
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Publication No.: US08351018B2Publication Date: 2013-01-08
- Inventor: Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Clemens Johannes Gerardus Van Den Dungen , Koen Steffens , Arnold Jan Van Putten
- Applicant: Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Clemens Johannes Gerardus Van Den Dungen , Koen Steffens , Arnold Jan Van Putten
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.
Public/Granted literature
- US20090279060A1 FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-11-12
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