发明授权
- 专利标题: Backside illuminated sensor processing
- 专利标题(中): 背面照明传感器处理
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申请号: US13275935申请日: 2011-10-18
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公开(公告)号: US08354295B2公开(公告)日: 2013-01-15
- 发明人: Yuer-Luen Tu , Chia-Shiung Tsai , Ching-Chun Wang , Ren-Jie Lin , Shou-Gwo Wuu
- 申请人: Yuer-Luen Tu , Chia-Shiung Tsai , Ching-Chun Wang , Ren-Jie Lin , Shou-Gwo Wuu
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Haynes and Boone, LLP
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
The present disclosure provides methods and apparatus for reducing dark current in a backside illuminated semiconductor device. In one embodiment, a method of fabricating a semiconductor device includes providing a substrate having a frontside surface and a backside surface, and forming a plurality of sensor elements in the substrate, each of the plurality of sensor elements configured to receive light directed towards the backside surface. The method further includes forming a dielectric layer on the backside surface of the substrate, wherein the dielectric layer is formed to have a compressive stress to induce a tensile stress in the substrate. A backside illuminated semiconductor device fabricated by such a method is also disclosed.
公开/授权文献
- US20120034730A1 Backside Illuminated Sensor Processing 公开/授权日:2012-02-09
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