Invention Grant
- Patent Title: Backside illuminated sensor processing
- Patent Title (中): 背面照明传感器处理
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Application No.: US13275935Application Date: 2011-10-18
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Publication No.: US08354295B2Publication Date: 2013-01-15
- Inventor: Yuer-Luen Tu , Chia-Shiung Tsai , Ching-Chun Wang , Ren-Jie Lin , Shou-Gwo Wuu
- Applicant: Yuer-Luen Tu , Chia-Shiung Tsai , Ching-Chun Wang , Ren-Jie Lin , Shou-Gwo Wuu
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
The present disclosure provides methods and apparatus for reducing dark current in a backside illuminated semiconductor device. In one embodiment, a method of fabricating a semiconductor device includes providing a substrate having a frontside surface and a backside surface, and forming a plurality of sensor elements in the substrate, each of the plurality of sensor elements configured to receive light directed towards the backside surface. The method further includes forming a dielectric layer on the backside surface of the substrate, wherein the dielectric layer is formed to have a compressive stress to induce a tensile stress in the substrate. A backside illuminated semiconductor device fabricated by such a method is also disclosed.
Public/Granted literature
- US20120034730A1 Backside Illuminated Sensor Processing Public/Granted day:2012-02-09
Information query
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