Invention Grant
- Patent Title: Manufacturing method of photonic crystal
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Application No.: US12227594Application Date: 2006-06-01
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Publication No.: US08361545B2Publication Date: 2013-01-29
- Inventor: In Sung Park , Tae Ho Lee , Jin Ho Ahn , Rana Biswas , Kristen P. Constant , Kai-Ming Ho , Jae-Hwang Lee
- Applicant: In Sung Park , Tae Ho Lee , Jin Ho Ahn , Rana Biswas , Kristen P. Constant , Kai-Ming Ho , Jae-Hwang Lee
- Applicant Address: KR Seoul US IA Ames
- Assignee: IUCF-HYU Industry-University Cooperation Foundation, Hanyang University,Iowa State University Research Foundation, Inc.
- Current Assignee: IUCF-HYU Industry-University Cooperation Foundation, Hanyang University,Iowa State University Research Foundation, Inc.
- Current Assignee Address: KR Seoul US IA Ames
- Agency: Harness, Dickey & Pierce, P.L.C.
- International Application: PCT/KR2006/002112 WO 20060601
- International Announcement: WO2007/139245 WO 20071206
- Main IPC: B05D5/06
- IPC: B05D5/06

Abstract:
A manufacturing method of a photonic crystal is provided. In the method, a high-refractive-index material is conformally deposited on an exposed portion of a periodic template composed of a low-refractive-index material by an atomic layer deposition process so that a difference in refractive indices or dielectric constants between the template and adjacent air becomes greater, which makes it possible to form a three-dimensional photonic crystal having a superior photonic bandgap. Herein, the three-dimensional structure may be prepared by a layer-by-layer method.
Public/Granted literature
- US20090169735A1 Manufacturing method of photonic crystal Public/Granted day:2009-07-02
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