Invention Grant
- Patent Title: Method for monitoring chamber cleanliness
- Patent Title (中): 监测室清洁度的方法
-
Application No.: US11350516Application Date: 2006-02-09
-
Publication No.: US08361814B2Publication Date: 2013-01-29
- Inventor: Dror Shemesh , Michal Eilon , Hen Doozli , Ekaterina Rechav , Eitan Binyamini
- Applicant: Dror Shemesh , Michal Eilon , Hen Doozli , Ekaterina Rechav , Eitan Binyamini
- Applicant Address: IL Rehovot
- Assignee: Applied Materials, Israel, Ltd.
- Current Assignee: Applied Materials, Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H01L21/66 ; B08B3/00 ; B08B5/00
Abstract:
A method for evaluating a cleanliness of a tool, the method includes: receiving a wafer; cleaning the wafer; placing the wafer into the tool for a predefined period; removing the wafer from the tool, performing a contact angle measurement and determining the cleanliness of the wafer.
Public/Granted literature
- US20060216839A1 Method for monitoring chamber cleanliness Public/Granted day:2006-09-28
Information query
