Invention Grant
US08363209B2 Method and apparatus to adjust misalignment of the maskless exposure apparatus
有权
调整无掩模曝光装置的未对准的方法和装置
- Patent Title: Method and apparatus to adjust misalignment of the maskless exposure apparatus
- Patent Title (中): 调整无掩模曝光装置的未对准的方法和装置
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Application No.: US12452565Application Date: 2008-06-25
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Publication No.: US08363209B2Publication Date: 2013-01-29
- Inventor: Young Hoon Shin , Won Ho Seo , Myung Ju Park , Hyung Jin Lee , Sang Hwan Cha , Tae Ho Lee , Chang Ju Rhee
- Applicant: Young Hoon Shin , Won Ho Seo , Myung Ju Park , Hyung Jin Lee , Sang Hwan Cha , Tae Ho Lee , Chang Ju Rhee
- Applicant Address: KR Seoul
- Assignee: LG Electronics Inc.
- Current Assignee: LG Electronics Inc.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2007-0069238 20070710; KR10-2007-0069282 20070710; KR10-2007-0073431 20070723; KR10-2007-0099194 20071002
- International Application: PCT/KR2008/003632 WO 20080625
- International Announcement: WO2009/008605 WO 20090115
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/68 ; G03B27/42 ; G03B27/32 ; G03B27/52 ; G03B27/58
Abstract:
Disclosed is a maskless exposure method, where it is possible to perform a more precise optical alignment using a first pattern of a maskless exposure part and a second pattern of a main reference unit, and it is also possible to reduce generation of a blur in an exposed pattern.
Public/Granted literature
- US20100208229A1 Maskless exposure method Public/Granted day:2010-08-19
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