Invention Grant
- Patent Title: Measurement apparatus and method of manufacturing optical system
- Patent Title (中): 光学系统制造的测量装置及方法
-
Application No.: US12836218Application Date: 2010-07-14
-
Publication No.: US08363227B2Publication Date: 2013-01-29
- Inventor: Eiji Aoki
- Applicant: Eiji Aoki
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2009-167261 20090715
- Main IPC: G01B11/02
- IPC: G01B11/02

Abstract:
The present invention provides a measurement apparatus which measures a wavefront of light traveling from a member to be measured, the apparatus including a first reference surface, a second reference surface configured to function as a reference surface for the first reference surface, an optical system configured to form a first interference pattern of light traveling from the member to be measured and light traveling from the first reference surface, and a second interference pattern of light traveling from the first reference surface and light traveling from the second reference surface, a detection unit configured to detect the first interference pattern and the second interference pattern, respectively, and a calculation unit configured to calculate a wavefront of light traveling from the member to be measured based on the first interference pattern and the second interference pattern detected by the detection unit.
Public/Granted literature
- US20110013196A1 MEASUREMENT APPARATUS AND METHOD OF MANUFACTURING OPTICAL SYSTEM Public/Granted day:2011-01-20
Information query