Invention Grant
- Patent Title: Dopant profile control for high speed silicon-based optical modulators
- Patent Title (中): 高速硅基光调制器的掺杂分布控制
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Application No.: US13029342Application Date: 2011-02-17
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Publication No.: US08363986B2Publication Date: 2013-01-29
- Inventor: Mark Webster , Vipulkumar Patel , Prakash Gothoskar , David Piede
- Applicant: Mark Webster , Vipulkumar Patel , Prakash Gothoskar , David Piede
- Main IPC: G02F1/035
- IPC: G02F1/035 ; G02F1/01 ; G02B6/26 ; G02B6/42

Abstract:
A high speed silicon-based optical modulator with control of the dopant profiles in the body and gate regions of the device reduces the series resistance of the structure without incurring substantial optical power loss. That is, the use of increased dopant values in areas beyond the active region will allow for the series resistance to be reduced (and thus increase the modulating speed of the device) without incurring too large a penalty in signal loss. The dopant profiles within the gate and body regions are tailored to exhibit an intermediate value between the high dopant concentration in the contact areas and the low dopant concentration in the carrier integration window area.
Public/Granted literature
- US20110222812A1 Dopant Profile Control For High Speed Silicon-Based Optical Modulators Public/Granted day:2011-09-15
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