Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US12606880Application Date: 2009-10-27
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Publication No.: US08368047B2Publication Date: 2013-02-05
- Inventor: Doyeol Ahn
- Applicant: Doyeol Ahn
- Applicant Address: KR Seoul
- Assignee: University of Seoul Industry Cooperation Foundation
- Current Assignee: University of Seoul Industry Cooperation Foundation
- Current Assignee Address: KR Seoul
- Agency: Workman Nydegger
- Main IPC: H01L29/06
- IPC: H01L29/06

Abstract:
Semiconductor devices including a light emitting layer, and at least one surface plasmon metal layer in contact with the light emitting layer are provided. The light emitting layer includes an active layer having a first band gap, and one or more barrier layers having a second band gap. The first band gap is smaller than the second band gap. Methods for fabricating semiconductor devices are also provided.
Public/Granted literature
- US20110095309A1 SEMICONDUCTOR DEVICE Public/Granted day:2011-04-28
Information query
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