发明授权
- 专利标题： Wafer thermometer, temperature measuring device, heat treatment device and method for measuring temperature of heat treatment unit
- 专利标题（中）： 晶圆温度计，温度测量装置，热处理装置及热处理装置的温度测定方法
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申请号： US12407110申请日： 2009-03-19
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公开(公告)号： US08378269B2公开(公告)日： 2013-02-19
- 发明人: Toshiyuki Matsumoto , Naozo Sugimoto
- 申请人： Toshiyuki Matsumoto , Naozo Sugimoto
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Ditthavong Mori & Steiner, P.C.
- 优先权： JP2008-092594 20080331
- 主分类号： H05B3/68
- IPC分类号： H05B3/68 ; G01K7/00
摘要：
A wafer thermometer includes a wafer, a plurality of temperature sensors, a converter, a wafer data transmitter, and a photoelectric conversion element. The wafer has an upper surface divided to a plurality of regions. The plurality of temperature sensors are arranged at the plurality of regions, respectively. The converter is provided on the wafer and configured to convert signals output from the plurality of temperature sensors to temperature data. The wafer data transmitter is provided on the wafer and configured to transmit the temperature data converted by the converter. The photoelectric conversion element is provided on the wafer and configured to supply a current to the converter and the wafer data transmitter in response to light with which the photoelectric conversion element is irradiated.
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