发明授权
- 专利标题: Methods of fabricating reticles with subdivided blocking regions
- 专利标题(中): 制造具有细分阻挡区域的掩模版的方法
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申请号: US13305987申请日: 2011-11-29
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公开(公告)号: US08383301B2公开(公告)日: 2013-02-26
- 发明人: J. Brett Rolfson
- 申请人: J. Brett Rolfson
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: TraskBritt
- 主分类号: G03F1/00
- IPC分类号: G03F1/00 ; G03F1/40
摘要:
Methods for designing, fabricating, and using attenuated phase shift reticles, or photomasks are disclosed. Methods are also disclosed for subdividing the radiation blocking regions of previously fabricated reticles of previously existing designs. The methods may include forming radiation blocking regions that are subdivided, by cut lines, into discrete, spaced apart sections with dimensions (e.g., surface area, etc.) configured to minimize or eliminate the buildup of electrostatic energy by the radiation blocking regions and/or the discharge of electrostatic energy from the radiation blocking regions and the damage that may be caused by such electrostatic discharge. The methods may include configuring the reticle to prevent radiation from passing through the cut lines between adjacent sections of a subdivided radiation blocking region.
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