- 专利标题： Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus
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申请号： US13361645申请日： 2012-01-30
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公开(公告)号： US08394572B2公开(公告)日： 2013-03-12
- 发明人: Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
- 申请人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/004 ; G03F7/11
摘要：
A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
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