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公开(公告)号：US09383195B2
公开(公告)日：2016-07-05
申请号：US12741733
申请日：2008-11-03
申请人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
发明人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
IPC分类号： G03F7/20 , G01B11/30 , G01N21/956
CPC分类号： G01B11/306 , G01N2021/95676 , G03F7/703 , G03F7/70783 , G03F7/7085
摘要： A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.
摘要翻译： 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括在柔性基板的表面处引导辐射束; 并且检测在辐射束之后的辐射束的强度分布或反射角度的变化已经从衬底的表面反射，以获得指示柔性衬底的表面的形貌的信息。
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2.发明授权Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus 有权光刻用基板的制造方法，基板，装置的制造方法，密封涂布装置以及密封涂布测定装置公开(公告)号：US08114568B2
公开(公告)日：2012-02-14
申请号：US12289919
申请日：2008-11-06
申请人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
发明人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
CPC分类号： G03F7/70916 , G03F7/11 , G03F7/70341
摘要： A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
摘要翻译： 用于光刻投影装置的基板。 衬底包括密封涂层，其覆盖衬底上的两层之间或层与衬底之间的第一界面的至少一部分，并且不延伸到衬底的中心部分。
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3.发明申请Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus 有权光刻用基板的制造方法，基板，装置的制造方法，密封涂布装置以及密封涂布测定装置公开(公告)号：US20090201485A1
公开(公告)日：2009-08-13
申请号：US12289919
申请日：2008-11-06
申请人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
发明人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
CPC分类号： G03F7/70916 , G03F7/11 , G03F7/70341
摘要： A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
摘要翻译： 用于光刻投影装置的基板。 衬底包括密封涂层，其覆盖衬底上的两层之间或层与衬底之间的第一界面的至少一部分，并且不延伸到衬底的中心部分。
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公开(公告)号：US20090115979A1
公开(公告)日：2009-05-07
申请号：US12289537
申请日：2008-10-29
申请人： Marcus Theodoor Wilhelmus Van Der Heijden , Ronald Harm Gunther Kramer , Frederik Johannes Van Den Bogaard , Peter Gerardus Hubertus Maria Janssen
发明人： Marcus Theodoor Wilhelmus Van Der Heijden , Ronald Harm Gunther Kramer , Frederik Johannes Van Den Bogaard , Peter Gerardus Hubertus Maria Janssen
IPC分类号： G03B27/62
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/707 , G03F7/70916
摘要： A sampler, sample holder and an immersion lithographic apparatus comprising a sampler is disclosed. In an embodiment, a sampler is provided to collect particles in an immersion system of a lithographic apparatus. The sampler comprises a holder base having a collector surface. The collector surface is configured to collect and store contaminants. The sampler may be located on a surface of the immersion system so as to collect sample particles by contact of the collector surface with a liquid or with a surface of the immersion system. The sampler may be removable from the immersion lithographic apparatus for inspection.
摘要翻译： 公开了一种采样器，样品架和包括取样器的浸没式光刻设备。 在一个实施例中，提供采样器以收集光刻设备的浸没系统中的颗粒。 采样器包括具有收集器表面的保持器基座。 收集器表面被配置为收集和存储污染物。 采样器可以位于浸没系统的表面上，以便通过收集器表面与液体或浸没系统的表面接触来收集样品颗粒。 取样器可以从浸没式光刻设备中移除以进行检查。
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公开(公告)号：US20090014030A1
公开(公告)日：2009-01-15
申请号：US11822695
申请日：2007-07-09
申请人： Anthonius Martinus Cornelis Petrus De Jong , Igor Petrus Maria Bouchoms , Richard Joseph Bruls , Hans Jansen , Martinus Hendrikus Antonius Leenders , Peter Franciscus Wanten , Marcus Theodoor Wilhelmus Van Der Heijden , Jacques Cor Johan Van Der Donck , Frederik Johannes Van Den Bogaard , Jan Groenewold , Sandra Van Der Graaf , Carmen Julia Zoldesi
发明人： Anthonius Martinus Cornelis Petrus De Jong , Igor Petrus Maria Bouchoms , Richard Joseph Bruls , Hans Jansen , Martinus Hendrikus Antonius Leenders , Peter Franciscus Wanten , Marcus Theodoor Wilhelmus Van Der Heijden , Jacques Cor Johan Van Der Donck , Frederik Johannes Van Den Bogaard , Jan Groenewold , Sandra Van Der Graaf , Carmen Julia Zoldesi
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70916
摘要： A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed.
摘要翻译： 公开了一种从光刻中使用的设备中除去污染物的方法。 该方法包括将基底装载到装置中，基底包括刚性支撑层和设置在刚性支撑层上的可变形层，使得基底的可变形层与待除去污染的装置的表面接触 引入可变形层与设备表面之间的相对运动，从该表面去除污染物以从表面去除污染物以便去除，并除去脱落的污染物。 还描述和要求保护本发明的其它方面。
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公开(公告)号：US08394572B2
公开(公告)日：2013-03-12
申请号：US13361645
申请日：2012-01-30
申请人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
发明人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
CPC分类号： G03F7/70916 , G03F7/11 , G03F7/70341
摘要： A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
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公开(公告)号：US20120281192A1
公开(公告)日：2012-11-08
申请号：US12741733
申请日：2008-11-03
申请人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
发明人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
CPC分类号： G01B11/306 , G01N2021/95676 , G03F7/703 , G03F7/70783 , G03F7/7085
摘要： A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.
摘要翻译： 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括在柔性基板的表面处引导辐射束; 并且检测在辐射束之后的辐射束的强度分布或反射角度的变化已经从衬底的表面反射，以获得指示柔性衬底的表面的形貌的信息。
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公开(公告)号：US08648997B2
公开(公告)日：2014-02-11
申请号：US12629691
申请日：2009-12-02
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716 , G03F7/70908 , G03F7/70925
摘要： A member with a cleaning surface for use in capturing particles in a lithographic apparatus is disclosed. The particles are captured by a plurality of projections which are arranged in a pattern. A sensor can be used to detect contaminant particles in the pattern.
摘要翻译： 公开了一种具有用于捕获光刻设备中的颗粒的清洁表面的构件。 颗粒被以图案排列的多个突起捕获。 传感器可用于检测图案中的污染物颗粒。
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9.发明申请METHOD OF PREPARING A SUBSTRATE FOR LITHOGRAPHY, A SUBSTRATE, A DEVICE MANUFACTURING METHOD, A SEALING COATING APPLICATOR AND A SEALING COATING MEASUREMENT APPARATUS 有权制备用于基体的基板的方法，基板，器件制造方法，密封涂层施加器和密封涂层测量装置公开(公告)号：US20120129098A1
公开(公告)日：2012-05-24
申请号：US13361645
申请日：2012-01-30
申请人： Marcus Theodoor Wilhelmus VAN DER HEIJDEN , Marco Koert STAVENGA , Patrick WONG , Frederik Johannes VAN DEN BOGAARD , Dirk DE VRIES , David BESSEMS , Jacques Roger, Alice MYCKE
发明人： Marcus Theodoor Wilhelmus VAN DER HEIJDEN , Marco Koert STAVENGA , Patrick WONG , Frederik Johannes VAN DEN BOGAARD , Dirk DE VRIES , David BESSEMS , Jacques Roger, Alice MYCKE
CPC分类号： G03F7/70916 , G03F7/11 , G03F7/70341
摘要： A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
摘要翻译： 用于光刻投影装置的基板。 衬底包括密封涂层，其覆盖衬底上的两层之间或层与衬底之间的第一界面的至少一部分，并且不延伸到衬底的中心部分。
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公开(公告)号：US20100141910A1
公开(公告)日：2010-06-10
申请号：US12629691
申请日：2009-12-02
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716 , G03F7/70908 , G03F7/70925
摘要： A member with a cleaning surface for use in capturing particles in a lithographic apparatus is disclosed. The particles are captured by a plurality of projections which are arranged in a pattern. A sensor can be used to detect contaminant particles in the pattern.
摘要翻译： 公开了一种具有用于捕获光刻设备中的颗粒的清洁表面的构件。 颗粒被以图案排列的多个突起捕获。 传感器可用于检测图案中的污染物颗粒。
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