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1.发明授权Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus 有权光刻用基板的制造方法，基板，装置的制造方法，密封涂布装置以及密封涂布测定装置公开(公告)号：US08114568B2
公开(公告)日：2012-02-14
申请号：US12289919
申请日：2008-11-06
申请人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
发明人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
CPC分类号： G03F7/70916 , G03F7/11 , G03F7/70341
摘要： A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
摘要翻译： 用于光刻投影装置的基板。 衬底包括密封涂层，其覆盖衬底上的两层之间或层与衬底之间的第一界面的至少一部分，并且不延伸到衬底的中心部分。
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2.发明申请Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus 有权光刻用基板的制造方法，基板，装置的制造方法，密封涂布装置以及密封涂布测定装置公开(公告)号：US20090201485A1
公开(公告)日：2009-08-13
申请号：US12289919
申请日：2008-11-06
申请人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
发明人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
CPC分类号： G03F7/70916 , G03F7/11 , G03F7/70341
摘要： A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
摘要翻译： 用于光刻投影装置的基板。 衬底包括密封涂层，其覆盖衬底上的两层之间或层与衬底之间的第一界面的至少一部分，并且不延伸到衬底的中心部分。
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公开(公告)号：US08394572B2
公开(公告)日：2013-03-12
申请号：US13361645
申请日：2012-01-30
申请人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
发明人： Marcus Theodoor Wilhelmus Van Der Heijden , Marco Koert Stavenga , Patrick Wong , Frederik Johannes Van Den Bogaard , Dirk De Vries , David Bessems , Jacques Roger Alice Mycke
CPC分类号： G03F7/70916 , G03F7/11 , G03F7/70341
摘要： A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
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4.发明授权Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method 有权平版印刷装置，装置的控制方法和装置的制造方法公开(公告)号：US08405817B2
公开(公告)日：2013-03-26
申请号：US12697583
申请日：2010-02-01
申请人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
发明人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
CPC分类号： G03F7/70341
摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。
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5.发明授权Substrate table, immersion lithographic apparatus and device manufacturing method 有权基板，浸没式光刻设备及器件制造方法公开(公告)号：US09059228B2
公开(公告)日：2015-06-16
申请号：US12721867
申请日：2010-03-11
申请人： Marco Koert Stavenga , Sergei Shulepov , Koen Steffens , Matheus Anna Karel Van Lierop , Samuel Bertrand Dominique David , David Bessems
发明人： Marco Koert Stavenga , Sergei Shulepov , Koen Steffens , Matheus Anna Karel Van Lierop , Samuel Bertrand Dominique David , David Bessems
IPC分类号： G03B27/58 , G03B27/60 , H01L21/68 , G03F7/20 , H01L21/687
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/707 , G03F7/70866 , H01L21/68 , H01L21/68735
摘要： A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
摘要翻译： 公开了一种用于浸没式光刻设备的衬底台，其具有构造成容纳给定尺寸的衬底的凹部和流体提取系统，其被配置为从衬底的边缘和凹部的边缘之间的间隙中提取流体， 流体提取系统被配置为使得从间隙的局部区域提取的流体的流速大于从间隙的另一部分提取的流体的流动速率。
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6.发明申请公开(公告)号：US20100214543A1
公开(公告)日：2010-08-26
申请号：US12697583
申请日：2010-02-01
申请人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
发明人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。
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公开(公告)号：US20220121131A1
公开(公告)日：2022-04-21
申请号：US17565144
申请日：2021-12-29
申请人： Marco Koert STAVENGA , Sergei Shulepov , Koen Steffens , Matheus Anna Karel Van Lierop , Samuel Bertrand Dominique David , David Bessems
发明人： Marco Koert STAVENGA , Sergei Shulepov , Koen Steffens , Matheus Anna Karel Van Lierop , Samuel Bertrand Dominique David , David Bessems
IPC分类号： G03F7/20 , H01L21/687 , H01L21/68
摘要： A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
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8.发明申请SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权基板表，倾斜平面设备和器件制造方法公开(公告)号：US20100277709A1
公开(公告)日：2010-11-04
申请号：US12721867
申请日：2010-03-11
申请人： Marco Koert STAVENGA , Sergei Shulepov , Koen Steffens , Matheus Anna Karel Van Lierop , Samuel Bertrand Dominique David , David Bessems
发明人： Marco Koert STAVENGA , Sergei Shulepov , Koen Steffens , Matheus Anna Karel Van Lierop , Samuel Bertrand Dominique David , David Bessems
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/707 , G03F7/70866 , H01L21/68 , H01L21/68735
摘要： A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
摘要翻译： 公开了一种用于浸没式光刻设备的衬底台，其具有构造成容纳给定尺寸的衬底的凹部和流体提取系统，其被配置为从衬底的边缘和凹部的边缘之间的间隙中提取流体， 流体提取系统被配置为使得从间隙的局部区域提取的流体的流速大于从间隙的另一部分提取的流体的流动速率。
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9.发明授权Fluid handling structure, a lithographic apparatus and a device manufacturing method 有权流体处理结构，光刻设备和装置制造方法公开(公告)号：US09563132B2
公开(公告)日：2017-02-07
申请号：US13564210
申请日：2012-08-01
申请人： David Bessems , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Rogier Hendrikus Magdalena Cortie , Adrianes Johannes Baeten , Cornelius Maria Rops
发明人： David Bessems , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Rogier Hendrikus Magdalena Cortie , Adrianes Johannes Baeten , Cornelius Maria Rops
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , Y10T137/2931
摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening at least partly surrounding and radially outward of the meniscus pinning feature; and optionally a gas recovery opening radially outward of the gas supply opening, wherein the gas supply opening, or the gas recovery opening, or both the gas supply opening and the gas recovery opening, has an open area per meter length which has a variation peripherally around the space.
摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在被配置为将浸没流体包含在流体处理结构外部的区域的边界处具有：弯液面钉扎特征，以阻止浸没流体径向向外 方向从空间; 至少部分地围绕所述弯液面钉扎特征并径向向外的气体供应开口; 并且可选地，气体供应开口径向向外的气体回收开口，其中气体供应开口或气体回收开口，或气体供应开口和气体回收开口两者具有每米长度的开放面积，其外围具有变化 在空间周围。
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公开(公告)号：US09618835B2
公开(公告)日：2017-04-11
申请号：US13017700
申请日：2011-01-31
申请人： Daniel Jozef Maria Direcks , Erik Henricus Egidius Catharina Eummelen , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Sergei Shulepov , Pieter Mulder , David Bessems , Marco Baragona
发明人： Daniel Jozef Maria Direcks , Erik Henricus Egidius Catharina Eummelen , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Sergei Shulepov , Pieter Mulder , David Bessems , Marco Baragona
IPC分类号： G03B27/52
CPC分类号： G03B27/52
摘要： In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.
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