发明授权
- 专利标题: Method for obtaining a layout design for an existing integrated circuit
- 专利标题(中): 获得现有集成电路布局设计的方法
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申请号: US13104986申请日: 2011-05-11
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公开(公告)号: US08394721B2公开(公告)日: 2013-03-12
- 发明人: Ming-Teng Hsieh , Yi-Nan Chen , Hsien-Wen Liu
- 申请人: Ming-Teng Hsieh , Yi-Nan Chen , Hsien-Wen Liu
- 申请人地址: TW Kueishan, Tao-Yuan Hsien
- 专利权人: Nanya Technology Corp.
- 当前专利权人: Nanya Technology Corp.
- 当前专利权人地址: TW Kueishan, Tao-Yuan Hsien
- 代理商 Winston Hsu; Scott Margo
- 主分类号: H01L21/311
- IPC分类号: H01L21/311
摘要:
A method for obtaining a layout design for an existing integrated circuit, in which, an integrated circuit die is polished with a tilt angle to form an inclined polished surface and one or more images of the inclined polished surface are obtained. The images may be overlapped directly, or the image or the images may be utilized to provide information to obtain a layout design comprising at least one repeating unit structure of the layout structure.