Invention Grant
- Patent Title: Releasing and post-releasing processes in fabrications for micromirror array devices
- Patent Title (中): 微镜阵列器件制造中的释放和释放过程
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Application No.: US11734458Application Date: 2007-04-12
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Publication No.: US08395837B2Publication Date: 2013-03-12
- Inventor: Hongqin Shi , Gregory Schaadt , James C. Dunphy , Dmitri Simonian , John D. Porter
- Applicant: Hongqin Shi , Gregory Schaadt , James C. Dunphy , Dmitri Simonian , John D. Porter
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent Warren L. Franz; Wade J. Brady, III; Frederick J. Telecky, Jr.
- Main IPC: G02B26/00
- IPC: G02B26/00
Abstract:
A releasing and post-releasing method for making a micromirror device and a micromirror array device are disclosed herein. The releasing method removes the sacrificial materials in the micromirror and micromirror array so as to enabling movements of the movable elements in the micromirror and micromirror array device. The post-releasing method is applied to improve the performance and quality of the released micromirrors and micromirror array devices.
Public/Granted literature
- US20120184067A1 Releasing and post-releasing processes in fabrications for micromirror array devices Public/Granted day:2012-07-19
Information query
