发明授权
- 专利标题： Process of manufacturing low resistance damascene coils
- 专利标题（中）： 制造低阻大马士革线圈的工艺
-
申请号： US12707652申请日： 2010-02-17
-
公开(公告)号： US08397371B2公开(公告)日： 2013-03-19
- 发明人: Daniel Wayne Bedell , David Patrick Druist , Edward Hin Pong Lee , Jennifer Ai-Ming Loo , Vladimir Nikitin , Sue Siyang Zhang
- 申请人： Daniel Wayne Bedell , David Patrick Druist , Edward Hin Pong Lee , Jennifer Ai-Ming Loo , Vladimir Nikitin , Sue Siyang Zhang
- 申请人地址： NL Amsterdam
- 专利权人： HGST Netherlands B.V.
- 当前专利权人： HGST Netherlands B.V.
- 当前专利权人地址： NL Amsterdam
- 代理机构： IPxLAW Group LLP
- 代理商 Maryam Imam
- 主分类号： G11B5/17
- IPC分类号： G11B5/17 ; G11B5/187
摘要：
In one embodiment and method of the present invention, a coil of a write head is created by forming a P1 pedestal layer and a back gap layer and further forming a coil pattern consistent with the coil to be formed and insulator spacers dispersed in the coil pattern, using a non-damascene process, thereafter the coil is formed by plating using a damascene process.
公开/授权文献
- US20100163523A1 FORMATION OF LOW RESISTANCE DAMASCENE COILS 公开/授权日：2010-07-01
信息查询
IPC分类:
