Invention Grant
- Patent Title: Surface defect inspection method and apparatus
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Application No.: US13221314Application Date: 2011-08-30
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Publication No.: US08400629B2Publication Date: 2013-03-19
- Inventor: Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
- Applicant: Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2007-115004 20070425; JP2007-156385 20070613
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/88

Abstract:
A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.
Public/Granted literature
- US20120008138A1 SURFACE DEFECT INSPECTION METHOD AND APPARATUS Public/Granted day:2012-01-12
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