发明授权
- 专利标题: Semiconductor device and manufacturing method for the same
- 专利标题(中): 半导体器件及其制造方法相同
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申请号: US13306754申请日: 2011-11-29
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公开(公告)号: US08404526B2公开(公告)日: 2013-03-26
- 发明人: Yuji Sasaki
- 申请人: Yuji Sasaki
- 申请人地址: JP Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: The Chicago Technology Law Group, LLC
- 代理商 Robert J. Depke
- 优先权: JP2008-231781 20080910
- 主分类号: H01L21/33
- IPC分类号: H01L21/33 ; H01L29/78 ; H01L29/06 ; H01L29/12
摘要:
A semiconductor device includes a first conductive type first semiconductor region, a second semiconductor region, and a second conductive type lateral RESURF region. The first semiconductor region is arranged on a first electrode side. The second semiconductor region includes first conductive type first pillar regions and a terminal part. The second pillar regions are alternately arranged on an element part. The terminal part is formed around the element part along a surface of the first semiconductor region on a second electrode side opposite to the first electrode side of the first semiconductor region. Furthermore, the second conductive type lateral RESURF region is formed in the second semiconductor region on the terminal part.
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