发明授权
US08404542B2 Semiconductor device having transistor with vertical gate electrode and method of fabricating the same 失效
具有具有垂直栅电极的晶体管的半导体器件及其制造方法

Semiconductor device having transistor with vertical gate electrode and method of fabricating the same
摘要:
A semiconductor device includes transistors with a vertical gate electrode. In a transistor structure, a semiconductor pattern has first and second sides facing in a transverse direction, and third and fourth sides facing in a longitudinal direction. Gate patterns are disposed adjacent to the first and second sides of the semiconductor pattern. Impurity patterns directly contact the third and fourth sides of the semiconductor pattern. A gate insulating pattern is interposed between the gate patterns and the semiconductor pattern.
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