发明授权
- 专利标题: Method of detecting a particle and a lithographic apparatus
- 专利标题(中): 检测颗粒和光刻设备的方法
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申请号: US12904610申请日: 2010-10-14
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公开(公告)号: US08405825B2公开(公告)日: 2013-03-26
- 发明人: Luigi Scaccabarozzi , Vadim Yevgenyevich Banine , Christian Wagner
- 申请人: Luigi Scaccabarozzi , Vadim Yevgenyevich Banine , Christian Wagner
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
A detector detects radiation from a mask to form an image, but the focal plane of the image is in front of the mask. Any particles arranged on the mask will be in focus. However, the pattern on the mask will be out of focus. It is therefore possible to detect the existence and location of particles on a mask having an arbitrary pattern. The depth of field of the detector is small and the focal plane is no further from the surface of the patterning device than two times the depth of field.