Invention Grant
US08409782B2 Photoresist composition comprising photoinitiators, and transparent thin film and liquid crystal display device using the composition
有权
包含光引发剂的光致抗蚀剂组合物和使用该组合物的透明薄膜和液晶显示装置
- Patent Title: Photoresist composition comprising photoinitiators, and transparent thin film and liquid crystal display device using the composition
- Patent Title (中): 包含光引发剂的光致抗蚀剂组合物和使用该组合物的透明薄膜和液晶显示装置
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Application No.: US12674408Application Date: 2009-06-22
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Publication No.: US08409782B2Publication Date: 2013-04-02
- Inventor: Keon Woo Lee , Sung Hyun Kim , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee , Chang Ho Cho , Kyoung Hoon Min
- Applicant: Keon Woo Lee , Sung Hyun Kim , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee , Chang Ho Cho , Kyoung Hoon Min
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd
- Current Assignee: LG Chem, Ltd
- Current Assignee Address: KR Seoul
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: KR10-2008-0063313 20080701; KR10-2009-0054850 20090619
- International Application: PCT/KR2009/003324 WO 20090622
- International Announcement: WO2010/002129 WO 20100107
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/027 ; G03F7/028
Abstract:
A photoresist composition is provided. The photoresist composition comprises two or more kinds of photoinitiators having different activation wavelengths whose difference is at least 20 nm. The photoresist composition has high sensitivity and forms a pattern whose thickness is easy to control depending on the exposure intensity through a slit or transflective mask. Further provided are a transparent thin film formed using the photoresist composition and a liquid crystal display device comprising the thin film.
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