发明授权
US08420422B2 Pattern forming method, processing method, and processing apparatus
有权
图案形成方法，处理方法和处理装置
- 专利标题： Pattern forming method, processing method, and processing apparatus
- 专利标题（中）： 图案形成方法，处理方法和处理装置
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申请号： US13041917申请日： 2011-03-07
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公开(公告)号： US08420422B2公开(公告)日： 2013-04-16
- 发明人: Masafumi Asano , Ryoichi Inanami , Masayuki Hatano
- 申请人： Masafumi Asano , Ryoichi Inanami , Masayuki Hatano
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JP2010-064916 20100319
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
According to the embodiments, a distribution of a recess portion shape is calculated based on a result obtained by measuring the recess portion shape of a first projection and recess pattern formed on a surface of a template. Next, a distribution of an application amount of a curing agent to a processing target layer is calculated based on the distribution of the recess portion shape, and the curing agent is applied to the processing target layer based on this distribution of the application amount of the curing agent. Next, a second projection and recess pattern is formed by transferring the first projection and recess pattern onto the curing agent by causing the curing agent to cure in a state where the first projection and recess pattern is in contact with the curing agent.